Photoresist
Revision as of 06:12, 24 July 2013 by (username removed)
Description
A light sensitive compound that is used for photolithography to produce integrated circuits. A thin layer of a photoresist is coated on a substrate. It is then covered with a mask and exposed to ultraviolet light. The UV light causes the exposed areas to polymerize then the nonexposed areas are washed and etched.